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Sputtering Targets

Dec. 23, 2024

Sputtering Targets

Sputtering Targets: Overview

About Sputtering Deposition

Sputtering deposition is a widely adopted method for creating thin films, which are layers of material with thicknesses that can vary from fractions of a nanometer to several micrometers. This process is crucial for the production of numerous electronic and optical components in today's technology.

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The sputtering deposition technique utilizes plasma, typically generated from an inert gas, to bombard a target material. This process ejects atoms from the target, which then settle onto a substrate, forming a thin film. One of the main advantages of sputtering is that the target does not need to be heated, allowing for versatility across multiple applications. Sputtering targets can be made from pure elements, compounds, or mixtures.

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Types of Sputtering Targets

Standard Targets

Our standard target sizes range from 1" to 8" in diameter and from 2mm to 1/2" thick. We can manufacture custom targets beyond these dimensions, including various rectangular, annular, and oval shapes upon request.

Rotatable Targets

For applications requiring large area thin films, American Elements produces rotatable sputtering targets using techniques such as casting or plasma deposition onto a tubular substrate. These targets can reach lengths of up to 1,000 mm and are available in a range of materials including single element, oxide, and alloy compositions, making them suitable for photovoltaic device manufacturing. All mechanical components are crafted from oversized blanks, machine finished to precise specifications with tolerances typically of +0.010"/-0" for diameter, length, or width, and +/-0.005" for thickness. Larger targets are also finished to a flatness within 0.015", with tighter tolerances available upon request.

Rods and Plates

American Elements can cast various rare earth metals and advanced materials into rod, bar, or plate forms, along with other machined designs. We have standard rod molds ranging from a minimum of 1/4" diameter to 3" diameter to cater to most rod requirements. Plates come in standard thicknesses from 1/4" to 1", with maximum dimensions subject to our melting capacity. Rods of smaller diameters might have a limit of 4"-6" for maximum cast length, while larger ones can reach up to 16". Plate sizes can be produced up to 24" x 16". All cast rods and plates are saw-cut to the specified length, though the surface may show visible flow marks.

For more titanium sputtering targets information, please contact us. We will provide professional answers.

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